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1. Wafer cleaning machine (semiconductor, mobile phone camera)
Ø Dedicated to cleaning wafers (Wafer) or glass surface dust after cutting, high-speed centrifugal dehydration, no water marks left on the surface of the workpiece
Ø The use of two-fluid cleaning device can effectively improve the cleaning effect
Ø Equipped with anti-static ion wind system
Ø Equipped with an air filtration system, the use of compressed air is cleaner
Ø The overall stainless steel mirror body is strong and durable, resistant to acid, alkali and other cleaning fluids
| Model | R-6008I | R-6008II |
| Appearance size | 420(L) × 620(W) × 1680(H) mm | 600(L)× 680(W) × 1680(H)mm |
| Fixture specification | 8 inches or less (using standard or customized ceramic suction cups) | 12 inches or less (using standard or customized ceramic suction cups) |
| Cleaning accuracy | Clean Particle particles of 0.5um and above | |
| cleaning method | Two-fluid cleaning + brush (optional) | |
| Drying method | High-speed centrifugal dehydration | |
| Standard fixing method | Microporous ceramic suction cup (can be customized according to the product) | |
| Pure water connection caliber | Φ012mm outer diameter hose or PT 1/2” female thread | |
| pure water supply | Pressure＞0.3Mpa; Flow＞10L/Min; Resistivity＞17MΩ° | |
| Pure water consumption | 0=8L/Min, normal working water consumption <120L/h | |
| Diameter of drainage outlet | FT 1″ Internal Thread | |
| Gas source inlet diameter | Φ10mm outer diameter hose or PT1/21 meat thread | |
| Air supply | 0.4-0.7Mpa; Filtration accuracy: 0.01um; Oil content: No oil: Water content: Pressure dew point -40°C | |
| Gas consumption | 10-40L/Min | |
| Exhaust port diameter | 4% (diameter 115)x2 (exhaust wind speed greater than 3M/Sec) | |
| Exhaust air volume | 400-700m/H | |
| power supply | AC380V; 50HZ | |
| total power | 2.2kw | |
| power consumption | 2.2W when cleaning; standby: 1Kw | |
| Transmission horsepower | 3 HP | |
| Centrifugal reading | Ji280-1800R/Min | |
| Environmental filter method | Filtration precision 0.5um Filtration efficiency 99.99% | |
| Air Filtration | 0.01umx1 (fine) | |
| cleaning pressure | 5-10Kgf/cm^2 | |
| Fluid fog path | less than 30um | |
| Machine net weight | About 140KG | About 160KG |
| Weight | 140 kg |
|---|---|
| Dimensions | 42 × 62 × 168 cm |
© 2001 R.Q.S Elettro All Right Reserve
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